Semiconductor device

ABSTRACT

A semiconductor device includes a substrate, a transistor formed over the substrate, insulating layers formed over the substrate, a multilayer wiring formed in the insulating layers, a first inductor formed in the insulating layers, and a second inductor formed over the first inductor and overlapping the first inductor. The insulating layers contain a silicon, wherein at least the two insulating layers are formed between the first inductor and the second inductor, and the first inductor and the second inductor are a spiral wiring pattern.

The present application is a Continuation Application of U.S. patentapplication Ser. No. 13/067,945, filed on Jul. 8, 2011, which is aContinuation Application of U.S. patent application Ser. No. 12/453,736,filed on May 20, 2009, now U.S. Pat. No. 8,004,062 , which are based onand claim priority from Japanese patent application No. 2008-148164,filed on Jun. 5, 2008, the entire contents of which is incorporatedherein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor device capable oftransmitting an electrical signal between two circuits having inputelectrical signals differing in potential from each other.

2. Description of the Related Art

In a case where an electrical signal is transmitted between two circuitshaving input electrical signals differing in potential from each other,a photocoupler is ordinarily used. The photocoupler has a light emittingelement such as a light emitting diode and a light receiving elementsuch as a phototransistor. An electrical signal input to thephotocoupler is converted into light by the light emitting element andthe electrical signal is restored from this light by the light receivingelement, thus transmitting the electrical signal.

Since the photocoupler has the light emitting element and the lightreceiving element, it is difficult to reduce the size of thephotocoupler. Also, the photocoupler is incapable of following anelectrical signal if the frequency of the electrical signal is high. Asa technique to solve these problems, a technique of transmitting anelectrical signal by using inductive coupling between two inductors, forexample, as described in National Publication of International PatentApplication No. 2001-513276 has been developed.

Japanese Patent Laid-Open No. 10-163422 discloses a technique of formingan inductance by using a plurality of wiring layers stacked on asemiconductor substrate with interlayer insulating films interposedtherebetween. In this technique, first circular-arc wiring patternsforming a winding on the input side and second-circular arc wiringpatterns forming a winding on the output side are alternately stacked.In each wiring layer, one of the circular-arc wiring patterns is formed.

The present inventor has recognized as follows. With respect to reducingthe size of a device which transmits an electrical signal between twocircuits having input electrical signals differing in potential fromeach other, application of a semiconductor device manufacturingtechnique to forming inductors in two wiring layers so that theinductors face each other through an interlayer insulating film isconceivable. In such a case, the insulation withstand voltage betweenthe two inductors is insufficient with respect to the potentialdifference between the two inductors due to the interlayer insulatingfilm having a small thickness. There is, therefore, a demand for atechnique to improve the insulating withstand voltage between the twoinductors.

SUMMARY

The present invention provides a semiconductor device including asubstrate, a multilayer wiring layer formed on the substrate and havingan insulating layer and a wiring layer alternately stacked in this ordert or more times (t≧3), a first inductor provided in the nth wiring layerin the multilayer wiring layer, and a second inductor provided in themth wiring layer in the multilayer wiring layer (t≧m≧n+2) and positionedabove the first inductor, wherein no inductor is provided in any of thewiring layers positioned between the nth wiring layer and the mth wiringlayer to be positioned above the first inductor.

In this semiconductor device, the at least two insulating layers arepositioned between the first inductor and the second inductor, and noinductor is provided in any of these insulating layers to be positionedabove the first inductor. As a result, the insulation withstand voltagebetween the first inductor and the second inductor is increased.

According to the present invention, the insulation withstand voltagebetween the first inductor and the second inductor can be increased.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other objects, advantages and features of the presentinvention will be more apparent from the following description ofcertain preferred embodiments taken in conjunction with the accompanyingdrawings, in which:

FIG. 1 is a sectional view of a semiconductor device according to afirst embodiment of the present invention;

FIG. 2 is a sectional view of a semiconductor device according to asecond embodiment of the present invention;

FIG. 3 is a sectional view of a semiconductor device according to athird embodiment of the present invention;

FIG. 4 is a sectional view showing a modified example of the thirdembodiment;

FIG. 5 is a sectional view of a semiconductor device according to afourth embodiment of the present invention;

FIG. 6 is a sectional view of a semiconductor device according to afifth embodiment of the present invention;

FIG. 7 is a sectional view of a semiconductor device according to asixth embodiment of the present invention;

FIG. 8 is a sectional view of a semiconductor device according to aseventh embodiment of the present invention; and

FIG. 9 is a sectional view of a semiconductor device according to aneighth embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Embodiments of the present invention will be described with reference tothe accompanying drawings. Similar components are indicated by the samereference numerals and redundancy of descriptions of them is avoided.

FIG. 1 is a sectional view of a semiconductor device in the firstembodiment. This semiconductor device has a substrate 10, a multilayerwiring layer 400, a first inductor 310 and a second inductor 320. Themultilayer wiring layer 400, the first inductor 310 and the secondinductor 320 are formed on the substrate 10. The multilayer wiring layer400 is formed by alternately stacking an insulating layer and a wiringlayer in this order t or more times (t≧3). The first inductor 310 isprovided in the nth wiring layer in the multilayer wiring layer 400. Thesecond inductor 320 is provided in the mth wiring layer in themultilayer wiring layer 400 (t≧m≧n+2) and positioned above the firstinductor 310. No inductor is provided in any of the wiring layerspositioned between the nth wiring layer and the mth wiring layer to bepositioned above the first inductor 310. The first inductor 310 and thesecond inductor 320 constitute a signal transmitting device 300 whichtransmits an electrical signal in either of two directions. Theelectrical signal is, for example, a digital signal. The electricalsignal may alternatively be an analog signal.

In the present embodiment, each of the first inductor 310 and the secondinductor 320 is a spiral wiring pattern formed in one wiring layer. Eachinsulating layer may have a structure in which a plurality of interlayerinsulating films are stacked or may be one interlayer insulating film.In the present embodiment, each insulating layer has a structure inwhich two interlayer insulating films are stacked.

In the present embodiment, the semiconductor device has a structure inwhich wirings 510, 520, 530, and 540 in four layers are stacked in thisorder. The wirings 510, 520, 530, and 540 are Cu wirings formed by adamascene method and respectively embedded in channels formed in thewiring layers 412, 422, 432, and 442. Pads (not shown) are formed in thewiring 540 in the uppermost layer. At least one of the wirings 510, 520,530, and 540 may be Al alloy wiring.

An interlayer insulating film 410 for forming contact plugs is providedbetween the substrate 10 and the wiring 510 in the lowermost layer.Insulating layers 420, 430, and 440 for forming vias are respectivelyformed between the wirings 510 and 520, between the wirings 520 and 530and between the wirings 530 and 540. On the substrate 10, the insulatinglayer 410, the wiring layer 412, the insulating layer 420, the wiringlayer 422, the insulating layer 430, the wiring layer 432, theinsulating layer 440 and the wiring layer 442 are stacked in this order.

Each of the insulating films constituting the insulating layers and thewiring layers may be an SiO₂ film or a low-dielectric-constant film. Thelow-dielectric-constant film may be an insulating film having adielectric constant of, for example, 3.3 or less, preferably 2.9 orless. As the material of the low-dielectric-constant film, polyhydrogensiloxane, such as hydrogen silsesquioxane (HSQ), methyl silsesquioxane(MSQ) or methylated hydrogen silsesquioxane (MHSQ), an organic materialcontaining an aromatic compound, such as polyallyl ether (PAE),divinyl-siloxane-bis-benzocyclobutene (BCB) or Silk (trademark), SOG,FOX (flowable oxide) (trademark), Cytop (trademark), benzocyclobutene(BCB) or the like may be used as well as SiOC. Also, as thelow-dielectric-constant film, a porous film of any of these materialsmay be used.

The first inductor 310 is positioned in the lowermost wiring layer 412,while the second inductor 320 is positioned in the uppermost wiringlayer 442. The two wiring layers 422 and 432 and the three insulatinglayers 420, 430, and 440 are positioned between the first inductor 310and the second inductor 320.

The substrate 10 is a first conduction type (e.g., p-type) ofsemiconductor substrate. The semiconductor device further has a firstcircuit 100 and a second circuit 200. The first circuit 100 is connectedto one of the first inductor 310 and the second inductor 320constituting the signal transmitting device 300. The second circuit 200is connected to the other of the first inductor 310 and the secondinductor 320. These connections are made by means of the multilayerwiring layer 400 on the substrate 10. The signal transmitting device 300is positioned, for example, between the first circuit 100 and the secondcircuit 200. However, the arrangement is not limited to this. Forexample, the signal transmitting device 300 may be included in the firstcircuit 100 or in the second circuit 200. The first circuit 100 and thesecond circuit 200 have input electrical signals differing in potentialfrom each other. With respect to the arrangement shown in FIG. 1, “inputelectrical signals differ in potential from each other” means that theamplitude (the difference between a potential representing 0 and apotential representing 1) of an electrical signal and the amplitude ofanother electrical signal are different from each other.

The first circuit 100 has first transistors, including afirst-conduction-type transistor and a second-conduction-typetransistor. A first first-conduction-type transistor 121 is formed in asecond-conduction-type well 120 and has two first-conduction-typeimpurity regions 124 forming a source and a drain and a gate electrode126. A first second-conduction-type transistor 141 is formed in afirst-conduction-type well 140 and has two second-conduction-typeimpurity regions 144 forming a source and a drain and a gate electrode146. Gate insulating films are respectively positioned below the gateelectrodes 126 and 146. These two gate insulating films aresubstantially equal in thickness to each other.

A second-conduction-type impurity region 122 is formed in the well 120,while a first-conduction-type impurity region 142 is formed in the well140. A piece of wiring through which a reference potential (groundpotential) is applied to the first first-conduction-type transistor 121is connected to the impurity region 122, while a piece of wiring throughwhich a reference potential is applied to the firstsecond-conduction-type transistor 141 is connected to the impurityregion 142.

The second circuit 200 has second transistors, also including afirst-conduction-type transistor and a second-conduction-typetransistor. A second first-conduction-type transistor 221 is formed in asecond-conduction-type well 220 and has two first-conduction-typeimpurity regions 224 forming a source and a drain and a gate electrode226. A second second-conduction-type transistor 241 is formed in afirst-conduction-type well 240 and has two second-conduction-typeimpurity regions 244 forming a source and a drain and a gate electrode246. Gate insulating films are respectively positioned below the gateelectrodes 226 and 246. In the example shown in the figure, these twogate insulating films are thicker than the gate insulating films of thefirst transistors provided in the first circuit. However, the gateinsulating films of the first transistors and the second transistors mayequal in thickness to each other.

A second-conduction-type impurity region 222 is formed in the well 220,while a first-conduction-type impurity region 242 is formed in the well240. A piece of wiring through which a reference potential (groundpotential) is applied to the second first-conduction-type transistor 221is connected to the impurity region 222, while a piece of wiring throughwhich a reference potential is applied to the secondsecond-conduction-type transistor 241 is connected to the impurityregion 242.

A method of manufacturing the semiconductor device according to thepresent embodiment will next be described. First, the first transistorsare formed in a first region in the substrate 10 (a region where thefirst circuit 100 is formed as shown in FIG. 1), and the secondtransistors are formed in a second region in the substrate 10 (a regionwhere the second circuit 200 is formed as shown in FIG. 1). Next, themultilayer wiring layer 400 is formed on the first transistor and thesecond transistor. When the multilayer wiring layer 400 is formed, thefirst inductor 310 and the second inductor 320 are formed above a thirdregion in the substrate 10 (a region above which the signal transmittingdevice 300 is formed as shown in FIG. 1). In the example shown in FIG.1, the second inductor 320 can be connected to the second circuit 200via pads (not shown) formed in the uppermost wiring layer 442 andbonding wires (not shown). With respect to the arrangement shown in FIG.1, “input electrical signals differ in potential from each other” meansthat the amplitude (the difference between a potential representing 0and a potential representing 1) of an electrical signal and theamplitude of another electrical signal are different from each other.

The operation and advantages of the present embodiment will bedescribed. When electrical energy or an electrical signal is transmittedthrough two inductors, the transmission efficiency is increased if thetwo inductors are brought closer to each other. In ordinary cases,therefore, the transmitting device is designed so that the two inductorsare brought as close as possible to each other. In a case where theplacement of the first inductor 310 and the second inductor 320 isdesigned on the basis of this design concept, the second inductor 320 isplaced in the wiring layer next to and above the wiring layer in whichthe first inductor 310 is placed.

In contrast, in the present embodiment, the first inductor 310 ispositioned in the nth wiring layer, while the second inductor 320 isplaced in the mth wiring layer (m≧n+2). Also, no inductor is provided inany of the wiring layers positioned between the nth wiring layer and themth wiring layer to be positioned above the first inductor 310. That is,the second inductor 320 is provided not in the wiring layer next to andabove the wiring layer in which the first inductor 310 is formed but inthe next wiring layer but one or more. Thus, the number of insulatingfilms (insulating layers) positioned between the first inductor 310 andthe second inductor 320 is increased relative to that in the case of thearrangement based on the above-described ordinary design concept,thereby increasing the insulation withstand voltage between the firstinductor 310 and the second inductor 320. This effect is particularlyhigh in a case where, as in the present embodiment, the first inductor310 is positioned in the first wiring layer while the second inductor320 is positioned in the uppermost wiring layer.

Also, the first inductor 310 and the second inductor 320 can be formedby only changing the wiring patterns in the wiring layers. Therefore,changes in the semiconductor device manufacturing facilities andprocessing conditions can be avoided and full use of the manufacturingconditions of the existing semiconductor device manufacturing facilitiescan be made.

Also, the first circuit 100, the second circuit 200 and the signaltransmitting device 300 are formed on one substrate 10 in one process.As a result, the manufacturing cost of the semiconductor device isreduced and the semiconductor device is made small in size.

FIG. 2 is a sectional view of a semiconductor device according to thesecond embodiment. This semiconductor device is the same as thesemiconductor device according to the first embodiment except that thesecond inductor 320 is positioned in the wiring layer 432 below theuppermost wiring layer 442. In the example shown in FIG. 2, the secondinductor 320 can be connected to the second circuit 200 via pads (notshown) formed in the uppermost wiring layer 442 and bonding wires. Withrespect to the arrangement shown in FIG. 2 as well as with respect tothe arrangement shown in FIG. 1, “input electrical signals differ inpotential from each other” means that the amplitude (the differencebetween a potential representing 0 and a potential representing 1) of anelectrical signal and the amplitude of another electrical signal aredifferent from each other.

The same advantages as those of the first embodiment can also beobtained by the present embodiment. Also, since the first inductor 310and the second inductor 320 are brought closer to each other, the signaltransmission efficiency is improved and the power necessary for signaltransmission in the signal transmitting device 300 is reduced.

FIG. 3 is a sectional view of a semiconductor device according to thethird embodiment. The construction of this semiconductor device is thesame as that in the first embodiment except that the first circuit 100and the signal transmitting device 300 are formed on the substrate 10and the second circuit 200 is formed on a substrate 20. In the exampleshown in the figure, the first inductor 310 is connected to the firstcircuit 100 through the multilayer wiring layer 400 on the substrate 10,while the second inductor 320 is connected to the second circuit 200 viapads (not shown) formed in the uppermost wiring layer 442 on thesubstrate 20 and bonding wires (not shown). With respect to thearrangement shown in FIG. 3, “input electrical signals differ inpotential from each other” means, for example, a case where theamplitude (the difference between a potential representing 0 and apotential representing 1) of an electrical signal and the amplitude ofanother electrical signal are different from each other, a case wherereference potentials (potentials representing 0) of electrical signalsare different from each other, and a combination of these cases.

The number of wiring layers on the substrate 10 and the number of wiringlayers on the substrate 20 are equal to each other in the example shownin the figure. However, these numbers may be different from each other.Also, while in the example shown in the figure the each layer and eachwiring on the substrate 10 and the corresponding layer and wiring on thesubstrate 20 equal in thickness to each other, the layers and wirings onthe substrates may differ in thickness from each other as in a modifiedexample shown in FIG. 4. In the example shown in FIG. 4, the layers andwirings on the substrate 20 are thicker than those on the substrate 10.However, the layers and wirings on the substrate 10 may alternatively bethicker than those on the substrate 20.

The same advantages as those of the first embodiment can also beobtained by the present embodiment. Also, since the first circuit 100and the second circuit 200 are respectively formed on differentsubstrates 10 and 20, a short circuit between the reference potential ofthe first transistors of the first circuit 100 and the referencepotential of the second transistors of the second circuit 200 can beprevented even if the reference potentials are largely different fromeach other (for example, the difference between the reference potentialsis 100 V or higher). Also, since the first inductor 310 is connected notto the second circuit 200 but to the first circuit 100, the possibilityof an increase in the potential difference between the first inductor310 and the substrate 10 is low. Therefore, the occurrence of dielectricbreakdown between the first inductor 310 and the substrate 10 can bereduced even though the first inductor 310 is placed in the lowermostwiring layer.

Also, the gate insulating films of the first transistors and the gateinsulating films of the second transistors are made largely differentfrom each other without using a complicated process.

FIG. 5 is a sectional view of a semiconductor device according to thefourth embodiment. This semiconductor device is the same as thesemiconductor device according to the first embodiment except that thesubstrate 10 is a silicon on insulator (SOI) substrate; embeddedinsulating layers 18 are formed in the substrate 10 between the firstregion in which the first circuit 100 is formed, the second region inwhich the second circuit 200 is formed and the third region above whichsignal transmitting device 300 is formed; and the first, second andthird regions are insulated from each other by the embedded insulatinglayers 18.

The substrate 10 has a structure in which an insulating layer 14 and asilicon layer 16 are stacked in this order on a base substrate (e.g., asilicon substrate) 12. The first transistors of the first circuit 100and the second transistors of the second circuit 200 are formed in thesilicon layer 16. The embedded insulating layers 18 are embedded in thesilicon layer 16, and bottom portions of the embedded insulating layers18 are in contact with the insulating layer 14. In the example shown inFIG. 5, the second inductor 320 can be connected to the second circuit200 via pads (not shown) formed in the uppermost wiring layer 442 andbonding wires (not shown). With respect to the arrangement shown in FIG.5, “input electrical signals differ in potential from each other” means,for example, a case where the amplitude (the difference between apotential representing 0 and a potential representing 1) of anelectrical signal and the amplitude of another electrical signal aredifferent from each other, a case where reference potentials (potentialsrepresenting 0) of electrical signals are different from each other, anda combination of these cases.

The same advantages as those of the first embodiment can also beobtained by the present embodiment. Also, since the first region inwhich the first circuit 100 is formed and the second region in which thesecond circuit 200 is formed are insulated from each other in thesubstrate 10, the occurrence of a short circuit between the referencepotential of the first transistors of the first circuit 100 and thereference potential of the second transistors of the second circuit 200can be reduced even if the reference potentials are largely differentfrom each other (for example, the difference between the referencepotentials is 100 V or higher).

FIG. 6 is a sectional view of a semiconductor device according to thefifth embodiment. The construction of this semiconductor device is thesame as that of the semiconductor device according to the fourthembodiment except that in the substrate 10 no embedded insulating layer18 is provided between the first region in which the first circuit 100is formed and the third region above which the signal transmittingdevice 300 is formed and the first region and the third region areelectrically connected to each other. The first inductor 310 isconnected to the first circuit 100. In the example shown in FIG. 6, thesecond inductor 320 can be connected to the second circuit 200 via pads(not shown) formed in the uppermost wiring layer 442 and bonding wires(not shown). With respect to the arrangement shown in FIG. 6, “inputelectrical signals differ in potential from each other” means, forexample, a case where the amplitude (the difference between a potentialrepresenting 0 and a potential representing 1) of an electrical signaland the amplitude of another electrical signal are different from eachother, a case where reference potentials (potentials representing 0) ofelectrical signals are different from each other, and a combination ofthese cases.

Also in the present embodiment, the first region and the third regionare insulated from the second region in the substrate 10. Therefore thesame advantages as those of the fourth embodiment can be obtained. Whilefirst region and the third region are electrically connected to eachother, the possibility of an increase in potential difference betweenthe first inductor 310 and the substrate 10 is low because the firstinductor 310 is connected not to the second circuit 200 but to the firstcircuit 100. Consequently, the occurrence of dielectric breakdownbetween the first inductor 310 and the substrate 10 can be reduced evenif the first inductor 310 is placed in the lowermost wiring layer 412.

FIG. 7 is a sectional view of a semiconductor device according to thesixth embodiment. This semiconductor device is the same as thesemiconductor device according to the fourth embodiment except that aplurality of embedded insulating layers 18 are provided in the substrate10 below the first inductor 310 while being spaced apart from eachother. In the example shown in FIG. 7, the second inductor 320 can beconnected to the second circuit 200 via pads (not shown) formed in theuppermost wiring layer 442 and bonding wires (not shown). With respectto the arrangement shown in FIG. 7, “input electrical signals differ inpotential from each other” means, for example, a case where theamplitude (the difference between a potential representing 0 and apotential representing 1) of an electrical signal and the amplitude ofanother electrical signal are different from each other, a case wherereference potentials (potentials representing 0) of electrical signalsare different from each other, and a combination of these cases.

The same advantages as those of the fourth embodiment can also beobtained by the present embodiment. Also, because a plurality ofembedded insulating layers 18 are provided in the substrate 10 below thefirst inductor 310 while being spaced apart from each other, theoccurrence of an eddy current in the substrate 10 due to a magnetic fluxformed by the first inductor 310 and the second inductor 320 can bereduced to lower the Q-value of the signal transmitting device 300.

FIG. 8 is a sectional view of a semiconductor device according to theseventh embodiment. This semiconductor device is the same as thesemiconductor device according to the sixth embodiment except thatembedded insulating layers 19 separated from the insulating layer 14 areused in place of the embedded insulating layers 18 in contact with theinsulating layer 14. The embedded insulating layers 19 are of a shallowtrench isolation (STI) structure and can be formed by the same processas that for forming device separating films for the first transistors ofthe first circuit 100 and the second transistors of the second circuit200. In the example shown in FIG. 8, the second inductor 320 can beconnected to the second circuit 200 via pads (not shown) formed in theuppermost wiring layer 442 and bonding wires (not shown). With respectto the arrangement shown in FIG. 8, “input electrical signals differ inpotential from each other” means, for example, a case where theamplitude (the difference between a potential representing 0 and apotential representing 1) of an electrical signal and the amplitude ofanother electrical signal are different from each other, a case wherereference potentials (potentials representing 0) of electrical signalsare different from each other, and a combination of these cases.

The same advantages as those of the sixth embodiment can also beobtained by the present embodiment. The same advantages can also beobtained by using an oxide film obtained by local oxidation of silicon(LOCOS) in place of the embedded insulating layer 19.

FIG. 9 is a sectional view of a semiconductor device according to theeighth embodiment. The construction of this semiconductor device is thesame as that of the semiconductor device according to the firstembodiment except that the embedded insulating layers 19 shown in theseventh embodiment are formed in the substrate 10 below the firstinductor 310. In the example shown in FIG. 9, the second inductor 320can be connected to the second circuit 200 via pads (not shown) formedin the uppermost wiring layer 442 and bonding wires (not shown). Withrespect to the arrangement shown in FIG. 9, “input electrical signalsdiffer in potential from each other” means that the amplitude (thedifference between a potential representing 0 and a potentialrepresenting 1) of an electrical signal and the amplitude of anotherelectrical signal are different from each other.

The same advantages as those of the first embodiment can also beobtained by the present embodiment. Also, the occurrence of an eddycurrent in the substrate 10 can be reduced to lower the Q-value of thesignal transmitting device 300. The same advantages can also be obtainedby using LOCOS oxide film in place of the embedded insulating layer 19.

While the embodiments of the present invention have been described withreference to the drawings, the described embodiments are only anillustration of the present embodiment and various arrangements otherthan those described above can also be adopted.

What is claimed is:
 1. A semiconductor device comprising: a substrate; atransistor formed over the substrate; insulating layers formed over thesubstrate; a multilayer wiring formed in the insulating layers; a firstinductor formed in the insulating layers; and a second inductor formedover the first inductor and overlapping the first inductor, wherein theinsulating layers contain a silicon, wherein at least the two insulatinglayers are formed between the first inductor and the second inductor,and wherein the first inductor and the second inductor are a spiralwiring pattern.
 2. The semiconductor device according to claim 1,wherein one of the insulating layers is SiO₂.
 3. The semiconductordevice according to claim 1, further comprising: a first circuit formedover the substrate, wherein the first circuit is connected to the firstinductor.
 4. The semiconductor device according to claim 3, furthercomprising: a second circuit connected to the second inductor.
 5. Thesemiconductor device according to claim 1, wherein the substratecomprises a silicon-on-insulator SOI substrate.
 6. The semiconductordevice according to claim 1, further comprising: a pad formed over thefirst inductor.
 7. The semiconductor device according to claim 1,wherein the first inductor and the second inductor is spiral wiringpattern.
 8. The semiconductor device according to claim 1, wherein thefirst inductor is made of copper.
 9. The semiconductor device accordingto claim 1, wherein the first inductor is made of aluminum.
 10. Asemiconductor device comprising: a substrate having an inductor regionformed over the substrate; a transistor formed over the substrate; afirst insulating layer formed over the substrate; a first wiring layerformed over the first insulating layer; a first inductor formed in thefirst wiring layer and the inductor region; a first wiring formed in thefirst wiring layer; a second insulating layer formed over the firstwiring layer; a second wiring layer formed over the second insulatinglayer; a second wiring formed in the second wiring layer; and a secondinductor formed over the second wiring layer and the inductor region,and overlapping the first inductor, wherein the first inductor and thesecond inductor have a spiral wiring pattern, wherein the first inductorand the second inductor are only inductor in the inductor region betweenthe first inductor and the second inductor, wherein the second wiringlayer contains a silicon.